Tetrasilane

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Tetrasilane is a silane with the structure formula SiH3–(SiH2)2–SiH3. It is the silane analog of butane.

Preparation

Tetrasilane can be prepared by reacting magnesium silicide (Mg2Si) with acids like 20% phosphoric acid in 50–60 °C.[1]

Mg2Si+ 4H+  SinH2n+2

The reaction can produce silanes up to n=15. The reaction of magnesium silicide with 25% hydrochloric acid produces 40% monosilane, 30% disilane, 15% trisilane, 10% tetrasilane and 5% higher silanes.[2] The mixture can be separated by fractional distillation.

In addition, higher silanes can also be obtained by discharges monosilane:[1]

SiH4  SiH2 + H2
SiH2 + SiH4 H3SiSiH3
SiH2 + H3SiSiH3 H3SiSiH2SiH3
SiH2 + H3SiSiH2SiH3 H3SiSiH2SiH2SiH3

Properties

Tetrasilane is a colourless, pyrophoric liquid that has a disgusting odour. Even below 54 °C, it will still spontaneous combust.[3] It is even more unstable than trisilane, slowly decomposing at room temperature, releasing hydrogen and forming shorter chain silanes.[4]

Reactions

Photochemical disproportionation of tetrasilane will produce 3-silylpentasilane and disilane.[5]

2 Si4H10 Si2H6 +H3SiSiH(Si2H6)2

With the presence of aluminium chloride, heating tetrasilane in xylene will allow isomerization to isotetrasilane.[6]

2 H3SiSiH2SiH2SiH3 H3SiSiH(SiH3)2

References

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