Reflectance difference spectroscopy

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Reflectance difference spectroscopy (RDS) is a spectroscopic technique which measures the difference in reflectance of two beams of light that are shone in normal incident on a surface with different linear polarizations.[1] It is also known as reflectance anisotropy spectroscopy (RAS).[2]

It is calculated as:

RDS=2rαrβrα+rβ,r

rα and rβ are the reflectance in two different polarizations.

The method was introduced in 1985 for the study optical properties of the cubic semiconductors silicon and germanium.[3] Due to its high surface sensitivity and independence of ultra-high vacuum, its use has been expanded to in situ monitoring of epitaxial growth[4] or the interaction of surfaces with adsorbates.[5] To assign specific features in the signal to their origin in morphology and electronic structure, theoretical modelling by density functional theory is required.

References

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  1. Peter Y. Yu, Manuel Cardona ,"Fundamentals of Semiconductors"
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