File:Depth-of-focus.JPG

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    English: This is a plot showing the depth of focus, measured in nanometers, as a function of numerical aperture, for the currently considered leading edge lithography tools. KrF means 248 nm wavelength, ArF means 193 nm wavelength, and EUV means 13.5 nm wavelength. "Wet" means water is used as the imaging medium (n=1.44), while "Dry" means air is used (n=1). EUV requires a vacuum for the imaging medium (n=1). The depth of focus formula used is 0.25*wavelength/(sin(angle/2))^2, where angle corresponds to the numerical aperture.
    Date 13 January 2008 (original upload date)
    Source Transferred from en.wikipedia to Commons.
    Author Guiding light at English Wikipedia

    Licensing

    Guiding light at English Wikipedia, the copyright holder of this work, hereby publishes it under the following licenses:
    GNU head Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License.
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    Original upload log

    The original description page was here. All following user names refer to en.wikipedia.
    Date/Time Dimensions User Comment
    2008-01-13 10:39 417×251× (14922 bytes) Guiding light This is a plot showing the depth of focus, measured in nanometers, as a function of numerical aperture, for the currently considered leading edge lithography tools. KrF means 248 nm wavelength, ArF means 193 nm wavelength, and EUV means 13.5 nm wavelength

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    13 January 2008

    14,922 byte

    251 pixel

    417 pixel

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    ab7de2e1ad77a9ae48df0d78fbec4ad78614847f

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    Date/TimeThumbnailDimensionsUserComment
    current12:06, 28 February 2016Thumbnail for version as of 12:06, 28 February 2016417 × 251 (15 KB)wikimediacommons>FastilyCloneTransferred from enwp

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